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SSPD_Chapter 6_Part 7_Introduction to ATHENA6_Process Simulator describes the need for multiple models for each process, choosing appropriate model with method statement,method statements during process flow,switching guidelines, modeling the correct substrate depth, simulating ion implantation, simulating ion implantation damage, simulating diffusion, simulating rapid thermal anneal and simulating oxidation.

SSPD_Chapter 6_Part 7_Introduction to ATHENA 6_Process Simulator.

7.7. Background of ATHENA.

7.7.3. Choosing Models In SSUPREM4

This section describes how to simulate process steps (e.g., implantation, diffusion/oxidation, epitaxy, and silicidation) specific to the SSUPREM4 module of ATHENA. Also discussed, are the SSUPREM4 model statements, such as METHOD, OXIDE, MATERIAL, and IMPURITY.

When simulating any process involving dopant or its diffusion or both, it is absolutely critical for simulation accuracy to use the appropriate model. Process steps where correct choice of models are vital include implantation, diffusion, rapid thermal annealing, oxidation, and epitaxy . This section provides specific advice on which models should be used for each process step. The Reason for Multiple Models for Each Process

The key to simulating any dopant related process is to accurately account for damage in the semiconductor. For example, in silicon processing, typical implantation doses can cause sufficient damage to the substrate to enhance dopant diffusion rates by three orders of magnitude or more, so choosing the wrong model in this instance will result in inaccurate results.

Well known device anomalies such as the Reverse Short Channel Effect in MOS processing or the emitter push effect in bipolar processing are wholly the result of such damage enhanced diffusion.

Other processes that consume the semiconductor, such as oxidation and silicidation also inject damage into the substrate. This must be accounted for if accurate dopant profiles are a requirement.

This section aims to provide you with a set of rules outlined, indicating the correct model that can be used most of the time without you having a detailed knowledge of the physics involved. The usual rules of model selection apply here. The more complicated the model, the greater the simulation time. There is always a compromise between simulation accuracy and simulation time. The following sections describe when to use the hierarchy of models so that the most complicated models are only used when you make a significant difference to the result. Choosing an Appropriate Model Using the Method Statement

The hierarchy of diffusion and damage models available is broadly related to the maximum level of damage already in the semiconductor or the maximum level of damage that the next process step is likely to introduce at any particular time during the process flow. The level of damage in the semiconductor at any one time is not a static quantity but will depend on when and how much damage was induced by a process step and how much annealing has occurred in subsequent thermal steps. The range of models available to you can account for all of the above effects and allows accurate simulation of dopant diffusion if appropriate models have been chosen.

Questions & Answers

How we are making nano material?
what is a peer
What is meant by 'nano scale'?
What is STMs full form?
scanning tunneling microscope
what is Nano technology ?
Bob Reply
write examples of Nano molecule?
The nanotechnology is as new science, to scale nanometric
nanotechnology is the study, desing, synthesis, manipulation and application of materials and functional systems through control of matter at nanoscale
Is there any normative that regulates the use of silver nanoparticles?
Damian Reply
what king of growth are you checking .?
What fields keep nano created devices from performing or assimulating ? Magnetic fields ? Are do they assimilate ?
Stoney Reply
why we need to study biomolecules, molecular biology in nanotechnology?
Adin Reply
yes I'm doing my masters in nanotechnology, we are being studying all these domains as well..
what school?
biomolecules are e building blocks of every organics and inorganic materials.
anyone know any internet site where one can find nanotechnology papers?
Damian Reply
sciencedirect big data base
Introduction about quantum dots in nanotechnology
Praveena Reply
what does nano mean?
Anassong Reply
nano basically means 10^(-9). nanometer is a unit to measure length.
do you think it's worthwhile in the long term to study the effects and possibilities of nanotechnology on viral treatment?
Damian Reply
absolutely yes
how to know photocatalytic properties of tio2 nanoparticles...what to do now
Akash Reply
it is a goid question and i want to know the answer as well
characteristics of micro business
for teaching engĺish at school how nano technology help us
How can I make nanorobot?
Do somebody tell me a best nano engineering book for beginners?
s. Reply
there is no specific books for beginners but there is book called principle of nanotechnology
how can I make nanorobot?
what is fullerene does it is used to make bukky balls
Devang Reply
are you nano engineer ?
fullerene is a bucky ball aka Carbon 60 molecule. It was name by the architect Fuller. He design the geodesic dome. it resembles a soccer ball.
what is the actual application of fullerenes nowadays?
That is a great question Damian. best way to answer that question is to Google it. there are hundreds of applications for buck minister fullerenes, from medical to aerospace. you can also find plenty of research papers that will give you great detail on the potential applications of fullerenes.
what is the Synthesis, properties,and applications of carbon nano chemistry
Abhijith Reply
Mostly, they use nano carbon for electronics and for materials to be strengthened.
is Bucky paper clear?
carbon nanotubes has various application in fuel cells membrane, current research on cancer drug,and in electronics MEMS and NEMS etc
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Source:  OpenStax, Solid state physics and devices-the harbinger of third wave of civilization. OpenStax CNX. Sep 15, 2014 Download for free at http://legacy.cnx.org/content/col11170/1.89
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