Chemistry of electronic materials

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Preface to the chemistry of electronic materials

Background to electronic materials

Introduction to semiconductors

1 Doped semiconductors

3 Crystal structure

4 Structures of element and compound semiconductors

Device fundamentals

Introduction to bipolar transistors

1 Basic mos structure

2 Introduction to the mos transistor and mosfets

3 Light emitting diode

4 Polymer light emitting diodes

Properties of gallium arsenide

0.1 Gallium: the element

0.2 Gallium pnictides

0.3 Gallium arsenide versus silicon

0.5 Carrier density

0.6 Electron mobility

0.7 Crystal growth

0.8 Crystal stress

0.9 Physical strength

0.10 Native oxide

0.11 Bibliography

1 Synthesis and purification of bulk semiconductors

1.1 Introduction

1.3 Metallurgical-grade silicon (mgs)

1.4 Electronic-grade silicon (egs)

1.5 Chlorosilane (seimens) process

1.6 Silane process

1.7 Granular polysilicon deposition

1.8 Zone refining

1.9 Gallium arsenide

1.10 Isolation and purification of gallium metal

1.11 Isolation and purification of elemental arsenic

1.12 Synthesis and purification of gallium arsenide.

1.13 Bibliography

2 Growth of gallium arsenide crystals

3 Ceramic processing of alumina

3.1 Introduction

3.2 Aluminum oxides and hydroxides

3.3 Ternary and mixed-metal oxides

3.4 Synthesis of aluminum oxide ceramics

3.5 Traditional ceramic processing

3.7 Bibliography

4 Piezoelectric materials synthesis

4.1 Introduction

4.2 Piezoelectric ceramics

4.3 Piezoelectric single crystals.

4.4 Piezoelectric thin films

4.5 Piezoelectric polymers

4.6 Piezoelectric composites

4.7 Piezoelectric coatings.

4.8 Bibliography

Wafer formation and processing

Formation of silicon and gallium arsenide wafers

0.1 Introduction

0.2 Wafer formation procedures

0.3 Crystal shaping

0.6 Orientation/identification flats

0.9 Heat treatment

0.10 Lapping or grinding

0.11 Edge contouring

0.13 Wet chemical etching

0.14 Etching silicon

0.15 Etching gallium arsenide

0.17 Differences between polishing and lapping

0.18 Process of polishing

0.20 Cleaning silicon

0.21 Cleaning gaas

0.22 Measurements, inspections and packaging

0.23 Bibliography

2 Applications for silica thin films

2.1 Introduction

2.2 Device isolation and gate insulation

2.3 Passivation

2.4 Planarization

2.5 Bibliography

3 Oxidation of silicon

4 Photolithography

5 Optical issues in photolithography

5.1 Introduction

5.2 Optical issues in photolithography

5.3 The critical dimension and depth of focus

5.4 Wavefront engineering

5.5 Interaction with resists

5.6 Light sources

5.7 Bibliography

6 Composition and photochemical mechanisms of photoresists

6.1 Photolithography

6.2 Photoresist

6.3 Photoresist composition

6.4 Negative photoresist chemistry

6.5 Positive photoresist chemistry

6.6 Image reversal

6.7 Comparison of positive and negative photoresists

6.8 Bibliography

7 Integrated circuit well and gate creation

8 Applying metallization by sputtering

Thin film growth

Molecular beam epitaxy

0.1 Introduction

0.2 Elemental and molecular sources

0.3 Substrate choice and preparation

0.4 Materials grown

0.5 Analysis techniques

0.6 Bibliography

1 Atomic layer deposition

2 Chemical vapor deposition

2.1 Introduction

2.2 Kinetics of cvd

2.3 The boundary layer

2.4 Rate limiting steps

2.5 Cvd systems

2.6 Precursor delivery

2.7 Thermal cvd reactors

2.8 Plasma-enhanced cvd

2.9 Photochemical cvd

2.10 Bibliography

3 Liquid phase deposition

Chemical vapor deposition

Selecting a molecular precursor for chemical vapor deposition

1 Determination of sublimation enthalpy and vapor pressure for inorganic

2 Metal organic chemical vapor deposition of calcium fluoride

3 Precursors for chemical vapor deposition of copper

3.1 Introduction

3.2 Applications of metal cvd

3.4 From cu(ii) precursors

3.5 Volatile cu(ii) compounds

3.6 Synthesis of cu(ii) precursors

3.7 Cu(hfac) 2 ·nh 2 O (n = 0, 1, 2)

3.8 Schiff-base complexes

3.9 Reaction mechanism

3.10 From cu(i) precursors

3.11 Precursor design

3.12 Reaction mechanism

3.13 Selectivity

3.14 Bibliography

Materials characterization

Rutherford backscattering of thin films

1 The application of vsi (vertical scanning interferometry) to the study

2 Atomic force microscopy

Introduction to nanoparticle synthesis

1 Carbon nanomaterials

3 Rolling molecules on surfaces under stm imaging

Economic and environmental issues

The environmental impact of the manufacturing of seminconductors

Source: OpenStax, Chemistry of electronic materials. OpenStax CNX. Aug 09, 2011 Download for free at http://cnx.org/content/col10719/1.9

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